Canadian Manufacturing

Chip delayering technology from Cdn. manufacturer found in national security application

by CM Staff   

Manufacturing Operations Sales & Marketing Technology / IIoT Electronics advanced manufacturing chips electronics In Focus Manufacturing marketing sales semiconductors Technology


Intlvac Thin Film uses its broad ion beam etching (IBE) technology which advances delayering outcomes.

HALTON HILLS — Intlvac Thin Film, a Canadian advanced manufacturing company, is now expanding its global customer base with its Nanoquest product lines that are used to delayer and analyse integrated circuits.

“For years we supplied our Nanoquest product lines for failure analysis where the end application was in semiconductor chip analysis and we xperienced year after year growth in that market. Integrated chip analysis has recently changed especially with enhanced scrutiny and security on components and integrated circuits inside telecom/datacom networks becoming of interest for national security reasons we are experiencing significant growth in this market,” explained Intlvac Thin Film President Dino Deligiannis.

“Industry has had years of semiconductor chip supply issues as companies transfer chip fabrication back to North America. Our chip delayering and failure analysis technologies are needed as the rise of counterfeits and recycled chips being used in commercial products and military applications has become a potential risk. Governments and businesses have a need to see in detail what is exactly inside and the quality of the semiconductor chips being used. Our Nanoquest product lines and technology for delayering of integrated circuits gives them that ability,” added Mr. Deligiannis.

Intlvac Thin Film uses its broad ion beam etching (IBE) technology which advances delayering outcomes, including tight layer planarization, nanometer etch layer precision, universal material removal and removal uniformity across layer. Ion Beam Etching is a dry plasma etch method which utilizes a remote broad ion beam source to remove IC chip material by physical inert gas means and chemical reactive gas means.

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